硅微透镜阵列的制备工艺

Fabrication Process for Microlens Array on Silicon

摘要:

开发了一种和MEMS工艺兼容的基于硅微加工技术的简易硅微透镜阵列制造技术。利用光刻胶热熔法和等离子体刻蚀法相结合的方法,实现了在硅晶圆上制作不同尺寸的硅微透镜阵列的工艺过程。实验中,对透镜制作过程中的热熔工艺、刻蚀工艺进行了深入的研究。最终确定了最优的工艺参数,制备了孔径在20~90μm、表面质量高的硅微透镜阵列。

Abstract:

A simple silicon microlens array manufacturing technology based on silicon micromachining technology compatible with MEMS process was developed in this paper. The photoresist hot melt method and plasma etching method were used to fabricate silicon microlens arrays of different sizes on silicon wafers. In the experiment, the hot melt technology and etching technology in the process of lens fabrication were studied deeply. Finally, the optimum technological parameters were determined, and the silicon microlens array with diameter of 20~90μm and high surface quality was prepared.