基于热熔法和干法刻蚀工艺的石英微透镜制备

Fabrication of microlens array on quartz by thermal reflow and dry etch process

摘要:

本文介绍了利用光刻胶热熔法和等离子体刻蚀法相结合的方法制作不同尺寸的石英微透镜的工艺过程。实验中,对透镜制作过程中的热熔工艺、刻蚀工艺进行了深入的研究。最终确定了最优的工艺参数,制备了直径20μm～70μm、表面质量高的石英微透镜阵列。

Abstract:

Fabrication process of quartz microlens arrays with different diameters based on photoresist thermal reflow and plasma etch method was introduced. The main process of microlens fabrication, such as reflow and inductive coupled plasma reactive ion etching (ICP-RIE), were studied. Finally, the optimal process parameters were determined, and quartz microlens arrays with diameters from 20μm to 70μm and high surface quality were prepared.