高耐压光电隔离开关结构设计及仿真验证

Structure Design and Simulation Verification of High-Votage Photoelectric Isolation Switch

摘要:

设计了一种高耐压光电隔离开关结构，采用氧化铝陶瓷作为外壳封装材料，工作温度覆盖军用元器件应用要求。内部采用光学隔离介质实现高隔离耐压特性，对结构进行了静电场仿真和热设计评价，仿真结果显示该结构隔离电压可达4000V以上，热设计满足-55℃~125℃工作温度范围。基于该结构成功实现了样品试制，进行了输入、输出特性和隔离电压测试，测试结果表明该结构具有良好的隔离耐压和功率耗散性能。

Abstract:

A kind of high-voltage photoelectric isolation switch structure was designed. Alumina ceramic was used as the housing material, and the working temperature covered the application requirements of military components. The internal opto-isolation medium is used to achieve high isolation and withstand pressure. The static field and thermal design evaluation are carried out. The simulation results show that the structure meets the requirements of thermal design. Based on this structure, the sample was successfully trial-produced, and the isolation voltage reached upon 4000V. The input and output characteristics of the structure were tested. And the structure has excellent isolation and power dissipation performance.