基于电容-电阻法评估碳化硅MOSFET电学参数
DOI:
CSTR:
作者:
作者单位:

1.国网智能电网研究院有限公司 先进输电技术国家重点实验室;2.中国科学院半导体研究所 半导体材料科学重点实验室

作者简介:

通讯作者:

中图分类号:

xx

基金项目:

国家电网科技计划项目(5500-202058402A-0-0-00)


Evaluation of the Electrical Parameters of SiC MOSFET by Capacitance-Resistance Method
Author:
Affiliation:

1.State Key Laboratory of Advanced Power Transmission Technology,State Grid Smart Grid Research Institute Co,Ltd Beijing China;2.Key Laboratory of Semiconductor Material Sciences,Institute of Semiconductors,Chinese Academy of Sciences

Fund Project:

  • 摘要
  • |
  • 图/表
  • |
  • 访问统计
  • |
  • 参考文献
  • |
  • 相似文献
  • |
  • 引证文献
  • |
  • 资源附件
  • |
  • 文章评论
    摘要:

    阈值电压、栅内阻、栅电容是碳化硅(SiC)金属氧化物半导体场效应晶体管(MOSFET)的重要电学参数,但受限于器件寄生电阻、栅介质界面态等因素,其提取过程较为复杂且容易衍生不准确性。基于此,通过器件建模和实验测试,揭示了MOSFET的栅电容非线性特征,构筑了电容-电阻串联电路测试方法,研究了SiC MOSFET的栅内阻和阈值电压特性。分别获得栅极阻抗和栅源电压、栅极电容和栅源电压的变化规律,得到栅压为-10 V时的栅内阻与目标值误差小于0.5 Ω,以及串联电容相对栅源电压变化最大时的电压近似为器阈值电压。相关结果与固定电流法作比较,并分别在SiC平面栅和沟槽栅MOSFET中得到验证。因此,该种电容-电阻法为SiC MOSFET器件所面临的阈值电压漂移、栅极开关振荡现象提供较为便捷的评估和预测手段。

    Abstract:

    The threshold voltage, internal gate resistance, and the gate capacitance are the key electrical parameters of silicon carbide (SiC) metal-oxide-semiconductor field-effect transistors (MOSFETs). However, extractions of them are complicated and prone to inaccuracy due to the limited factors of the parasitic resistance, gate-dielectric interfacial states in the devices. Therefore, through device modeling and experimental testing, the nonlinear characteristics of gate capacitance of MOSFETs were revealed, and a capacitance-resistance series circuit test method was constructed. Then, the internal gate resistance and threshold voltage characteristics of SiC MOSFETs were studied. The relationship between the gate impedance and gate-source voltage, and that between the gate capacitance and gate-source voltage, are achieved in this paper, revealing that the error between the gate internal resistance obtained at the gate voltage of -10 V, and the target value is less than 0.5 Ω. Meanwhile, the approximate value of the threshold voltage is the gate voltage at which the series capacitor significantly varies with respect to the gate-source voltage. The results are compared with these attained by the constant current method, and verified in SiC planar-gate and trench-gate MOSFETs, respectively. Therefore, this capacitance-resistance method provides a relatively convenient method for evaluating and predicting the characteristics of the threshold voltage drift and gate switching oscillations in SiC MOSFET.

    参考文献
    相似文献
    引证文献
引用本文
分享
文章指标
  • 点击次数:
  • 下载次数:
  • HTML阅读次数:
  • 引用次数:
历史
  • 收稿日期:2022-03-14
  • 最后修改日期:2022-03-14
  • 录用日期:2022-03-28
  • 在线发布日期:
  • 出版日期:
文章二维码

漂浮通知

①《半导体光电》新近入编《中文核心期刊要目总览》2023年版(即第10版),这是本刊自1992年以来连续第10次被《中文核心期刊要目总览》收录。
②目前,《半导体光电》已入编四个最新版高质量科技期刊分级目录,它们分别是中国电子学会《电子技术、通信技术领域高质量科技期刊分级目录》(T3)、中国图象图形学学会《图像图形领域高质量科技期刊分级目录》(T3)、中国电工技术学会《电气工程领域高质量科技期刊分级目录》(T3)和中国照明学会《照明领域高质量科技期刊分级目录》(T2)。
③关于用户登录弱密码必须强制调整的说明
④《半导体光电》微信公众号“半导体光电期刊”已开通,欢迎关注