暴露(002)晶面的WO3纳米片薄膜的光电催化性能

Study on Photoelectric Catalysis Performance of WO3 Nanoplate Films with Exposed (002) Facets

摘要:

采用一步水热法,以钨酸钠(Na₂WO₄·2H₂O)为原料,草酸(H₂C₂O₄)为结构导向剂,在FTO衬底上制备了具有高活性(002)面的WO₃纳米片薄膜。利用XRD,FESEM对薄膜的物相和形貌进行了分析,通过UV-Vis,PL对薄膜的能带结构和载流子的分离能力进行了表征,通过电化学工作站对WO₃薄膜的光电性能进行了研究。分析了草酸用量对WO₃纳米片薄膜的晶体取向、形貌尺寸和光电催化性能的影响。结果表明:草酸用量为0.30g时,WO₃纳米片薄膜的(002)面衍射峰强度最高,具有良好的光电催化性能。

Abstract:

WO₃ nanoplate films with highly active (002) facets were prepared on the FTO substrate with one-step hydrothermal method by using sodium tungstate dihydrate (Na₂WO₄·2H₂O) as the raw material and oxalic acid (H₂C₂O₄) as the structure-directing agent. The phase and morphology of the samples were characterized by XRD and FESEM. The energy band structure and carrier separation ability of the film were characterized by UV-Vis and PL. The photoelectric properties of WO₃ nanoplate films were characterized by electrochemical workstation. The effects of oxalic acid dosages on the crystal orientation, morphology, size and photocatalytic performance of WO₃ nanoplate films were investigated. The results show that the WO₃ nanoplate films with 0.3g oxalic acid dosages present the highest diffraction peak on the (002) facets and possess the best photocatalytic performance.