In this paper, using homogeneous and highly purified networks of semiconductor singlewalled carbon nanotubes (sSWCNTs) as the channel materials, and highly transparent and low sheet resistance networks of Ag nanowires (Ag NW) as the source and drain electrodes, largearea and transparent carbon nanotube thin film transistors were fabricated on glass substrates. Finally, polymethyl methacrylate (PMMA) thin films were used to drylaminating encapsulate the devices to obtain low hysteresis carbon nanotube transistors. Devices with overall transparency of more than 82% were obtained. The proposed method is not only easy to prepare materials with no requirement of high temperature process, but also can achieve large area fabrication of devices, which plays an important role in promoting the fabrication of fully transparent and flexible carbon nanotube thin film transistors.