采用Taguchi方法优化一种带外延层的PPD工艺参数

Process Parameters Optimization of Pinned Photodiode with Epitaxial Layer Using Taguchi Method

摘要:

引入Taguchi方法分析并优化一种带外延层的PPD结构(EPPD),并通过SILVACO软件进行验证。实验结果显示该方法通过对EPPD像素结构工艺参数的优化,提升了该结构抑制噪声的能力和光电转换性能。 更多还原

Abstract:

Taguchi method was adopted to analyze and optimize a pinned photodiode with epitaxial PPD structure (EPPD), and then it was simulated with SILVACO software. The experimental results show that this method is able to reduce the noise and improve the photoelectric conversion of EPPD by optimizing the process parameters.