Abstract:The influence of surfactant on multicrystalline silicon etching in HNO3/HF acid system was studied, and the silicon surface morphology was observed by SEM and confocal laser scanning microscope. On this basis, the influence of wettability and reactants mobility on the etching effect was investigated. Experimental results reveal that the etching rate is reduced in the surfactant etching system, and more homogenous sub micron texturing structure is formed on the silicon surface. The reflection index reduces from 23% to 18.5%, and meanwhile, the effective light receiving area is increased, the Isc and the opto electronic conversion efficiency are increased by 0.25mA/cm2 and 0.1%, respectively.