Abstract:A kind of close photonic crystal hemisphere pits array glass substrate applied in amorphous silicon thin film solar cells was studied. FDTD method is applied to make transmission diffraction field distribution calculations of the glass substrate. RCWA method is used to optimize the geometric parameters of the glass substrate, and an optimized configuration of 0.6μm period and 0.6μm minimum substrate thickness were obtained. Compared with flat structure, average reflectivity is reduced by 51.5% and the average absorption rate is increased by 18.6% within 0.3~0.8μm bandwidth. With the increase of the incident angle, the reflectivity peak blue shifts and decreases significantly. It achieves about 6% average reflectivity within 50o~65°incident angle.